Computational lithography

Computational lithography / Xu Ma and Gonzalo R. Arce.

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Superior document:Wiley series in pure and applied optics
:
ProQuest (Firm)
Ma, Xu, 1983-
TeilnehmendeR:
Arce, Gonzalo R.
ProQuest (Firm)
Year of Publication:2010
Language:English
Series:Wiley series in pure and applied optics.
Online Access:
Physical Description:xv, 226 p. :; ill.
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id 500588875
ctrlnum (MiAaPQ)500588875
(Au-PeEL)EBL588875
(CaPaEBR)ebr10419114
(CaONFJC)MIL275596
(OCoLC)689995793
collection bib_alma
fullrecord <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01550nam a2200421Ia 4500</leader><controlfield tag="001">500588875</controlfield><controlfield tag="003">MiAaPQ</controlfield><controlfield tag="005">20200520144314.0</controlfield><controlfield tag="006">m o d | </controlfield><controlfield tag="007">cr cn|||||||||</controlfield><controlfield tag="008">091215s2010 enka sb 001 0 eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">9780470596975</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="z">047059697X</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(MiAaPQ)500588875</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(Au-PeEL)EBL588875</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(CaPaEBR)ebr10419114</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(CaONFJC)MIL275596</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)689995793</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">MiAaPQ</subfield><subfield code="c">MiAaPQ</subfield><subfield code="d">MiAaPQ</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">TK7872.M3</subfield><subfield code="b">M3 2010</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">621.381531</subfield><subfield code="2">22</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Ma, Xu,</subfield><subfield code="d">1983-</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Computational lithography</subfield><subfield code="h">[electronic resource] /</subfield><subfield code="c">Xu Ma and Gonzalo R. Arce.</subfield></datafield><datafield tag="260" ind1=" " ind2=" "><subfield code="a">Oxford :</subfield><subfield code="b">Wiley-Blackwell,</subfield><subfield code="c">2010.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">xv, 226 p. :</subfield><subfield code="b">ill.</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">Wiley series in pure and applied optics</subfield></datafield><datafield tag="504" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index.</subfield></datafield><datafield tag="533" ind1=" " ind2=" "><subfield code="a">Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Microlithography</subfield><subfield code="x">Mathematics.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Integrated circuits</subfield><subfield code="x">Design and construction</subfield><subfield code="x">Mathematics.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Photolithography</subfield><subfield code="x">Mathematics.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Semiconductors</subfield><subfield code="x">Etching</subfield><subfield code="x">Mathematics.</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Resolution (Optics)</subfield></datafield><datafield tag="655" ind1=" " ind2="4"><subfield code="a">Electronic books.</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Arce, Gonzalo R.</subfield></datafield><datafield tag="710" ind1="2" ind2=" "><subfield code="a">ProQuest (Firm)</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">Wiley series in pure and applied optics.</subfield></datafield><datafield tag="856" ind1="4" ind2="0"><subfield code="u">https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=588875</subfield><subfield code="z">Click to View</subfield></datafield></record></collection>
record_format marc
spelling Ma, Xu, 1983-
Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
Oxford : Wiley-Blackwell, 2010.
xv, 226 p. : ill.
Wiley series in pure and applied optics
Includes bibliographical references and index.
Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries.
Microlithography Mathematics.
Integrated circuits Design and construction Mathematics.
Photolithography Mathematics.
Semiconductors Etching Mathematics.
Resolution (Optics)
Electronic books.
Arce, Gonzalo R.
ProQuest (Firm)
Wiley series in pure and applied optics.
https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=588875 Click to View
language English
format Electronic
eBook
author Ma, Xu, 1983-
spellingShingle Ma, Xu, 1983-
Computational lithography
Wiley series in pure and applied optics
author_facet Ma, Xu, 1983-
Arce, Gonzalo R.
ProQuest (Firm)
ProQuest (Firm)
author_variant x m xm
author2 Arce, Gonzalo R.
ProQuest (Firm)
author2_variant g r a gr gra
author2_role TeilnehmendeR
TeilnehmendeR
author_corporate ProQuest (Firm)
author_sort Ma, Xu, 1983-
title Computational lithography
title_full Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
title_fullStr Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
title_full_unstemmed Computational lithography [electronic resource] / Xu Ma and Gonzalo R. Arce.
title_auth Computational lithography
title_new Computational lithography
title_sort computational lithography
series Wiley series in pure and applied optics
series2 Wiley series in pure and applied optics
publisher Wiley-Blackwell,
publishDate 2010
physical xv, 226 p. : ill.
callnumber-first T - Technology
callnumber-subject TK - Electrical and Nuclear Engineering
callnumber-label TK7872
callnumber-sort TK 47872 M3 M3 42010
genre Electronic books.
genre_facet Electronic books.
url https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=588875
illustrated Illustrated
dewey-hundreds 600 - Technology
dewey-tens 620 - Engineering
dewey-ones 621 - Applied physics
dewey-full 621.381531
dewey-sort 3621.381531
dewey-raw 621.381531
dewey-search 621.381531
oclc_num 689995793
work_keys_str_mv AT maxu computationallithography
AT arcegonzalor computationallithography
AT proquestfirm computationallithography
status_str n
ids_txt_mv (MiAaPQ)500588875
(Au-PeEL)EBL588875
(CaPaEBR)ebr10419114
(CaONFJC)MIL275596
(OCoLC)689995793
hierarchy_parent_title Wiley series in pure and applied optics
is_hierarchy_title Computational lithography
container_title Wiley series in pure and applied optics
author2_original_writing_str_mv noLinkedField
noLinkedField
_version_ 1792330704699260928

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