Computational lithography / Xu Ma and Gonzalo R. Arce.
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Superior document: | Wiley series in pure and applied optics |
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Year of Publication: | 2010 |
Language: | English |
Series: | Wiley series in pure and applied optics.
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Online Access: | |
Physical Description: | xv, 226 p. :; ill. |
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Bibliography: | Includes bibliographical references and index. |
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ISBN: | 9780470596975 047059697X |
Hierarchical level: | Monograph |
Statement of Responsibility: | Xu Ma and Gonzalo R. Arce. |