Computational lithography

Computational lithography / Xu Ma and Gonzalo R. Arce.

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Bibliographic Details
Superior document:Wiley series in pure and applied optics
:
ProQuest (Firm)
Ma, Xu, 1983-
TeilnehmendeR:
Arce, Gonzalo R.
ProQuest (Firm)
Year of Publication:2010
Language:English
Series:Wiley series in pure and applied optics.
Online Access:
Physical Description:xv, 226 p. :; ill.
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100 1 |a Ma, Xu,  |d 1983- 
245 1 0 |a Computational lithography  |h [electronic resource] /  |c Xu Ma and Gonzalo R. Arce. 
260 |a Oxford :  |b Wiley-Blackwell,  |c 2010. 
300 |a xv, 226 p. :  |b ill. 
490 1 |a Wiley series in pure and applied optics 
504 |a Includes bibliographical references and index. 
533 |a Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. 
650 0 |a Microlithography  |x Mathematics. 
650 0 |a Integrated circuits  |x Design and construction  |x Mathematics. 
650 0 |a Photolithography  |x Mathematics. 
650 0 |a Semiconductors  |x Etching  |x Mathematics. 
650 0 |a Resolution (Optics) 
655 4 |a Electronic books. 
700 1 |a Arce, Gonzalo R. 
710 2 |a ProQuest (Firm) 
830 0 |a Wiley series in pure and applied optics. 
856 4 0 |u https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=588875  |z Click to View 

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