Semiconductor measurement technology : workshop on mass flow measurement and control for the semiconductor industry / Robert F. Berg ...
Saved in:
Superior document: | NIST special publications 400-101 |
---|---|
HerausgeberIn: | |
Place / Publishing House: | Washington, DC, 2001 |
Year of Publication: | 2001 |
Language: | English |
Series: | NIST special publications
400-101 |
Physical Description: | IV, 86 S.; Ill., graph. Darst.; 28 cm |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
id |
990000367610504498 |
---|---|
ctrlnum |
AC03227219 (AT-OBV)AC03227219 (Aleph)003221744ACC01 (DE-599)OBVAC03227219 (EXLNZ-43ACC_NETWORK)990032217440203331 |
collection |
bib_alma |
institution |
YWOAW |
building |
MAG2-1 |
fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>00782nam#a2200253zcb4500</leader><controlfield tag="001">990000367610504498</controlfield><controlfield tag="005">20230505203929.0</controlfield><controlfield tag="007">tu</controlfield><controlfield tag="008">010720|2001####|||###########|||#|#eng#c</controlfield><controlfield tag="009">AC03227219</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(AT-OBV)AC03227219</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">AC03227219</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(Aleph)003221744ACC01</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)OBVAC03227219</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(EXLNZ-43ACC_NETWORK)990032217440203331</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">OAW</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1=" " ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="c">XD-US</subfield></datafield><datafield tag="245" ind1="0" ind2="0"><subfield code="a">Semiconductor measurement technology</subfield><subfield code="b">workshop on mass flow measurement and control for the semiconductor industry</subfield><subfield code="c">Robert F. Berg ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Washington, DC</subfield><subfield code="c">2001</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">IV, 86 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield><subfield code="c">28 cm</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">NIST special publications</subfield><subfield code="v">400-101</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Berg, Robert F.</subfield><subfield code="4">edt</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="w">(AT-OBV)AC00350863</subfield><subfield code="v">400-101</subfield></datafield><datafield tag="970" ind1="1" ind2=" "><subfield code="c">37</subfield></datafield><datafield tag="ADM" ind1=" " ind2=" "><subfield code="b">2023-05-05 20:39:29 Europe/Vienna</subfield><subfield code="d">20</subfield><subfield code="f">System</subfield><subfield code="c">marc21</subfield><subfield code="a">2018-12-24 09:37:46 Europe/Vienna</subfield><subfield code="g">false</subfield></datafield><datafield tag="HOL" ind1="8" ind2=" "><subfield code="b">YWOAW</subfield><subfield code="h"> 100317.400/101 </subfield><subfield code="c">MAG2-1</subfield><subfield code="8">2218492770004498</subfield></datafield><datafield tag="852" ind1="8" ind2=" "><subfield code="b">YWOAW</subfield><subfield code="c">MAG2-1</subfield><subfield code="h"> 100317.400/101 </subfield><subfield code="8">2218492770004498</subfield></datafield><datafield tag="ITM" ind1=" " ind2=" "><subfield code="9">2218492770004498</subfield><subfield code="e">1</subfield><subfield code="m">BOOK</subfield><subfield code="b">+YW19640X</subfield><subfield code="i">100317.400/101</subfield><subfield code="2">MAG2-1</subfield><subfield code="o">2001-07-20 06:43:46</subfield><subfield code="8">2318492760004498</subfield><subfield code="f">02</subfield><subfield code="p">2001-07-20 02:00:00 Europe/Vienna</subfield><subfield code="h">100317.400/101</subfield><subfield code="1">YWOAW</subfield><subfield code="q">2022-06-20 23:34:59 Europe/Vienna</subfield></datafield></record></collection> |
record_format |
marc |
spelling |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry Robert F. Berg ... Washington, DC 2001 IV, 86 S. Ill., graph. Darst. 28 cm NIST special publications 400-101 Berg, Robert F. edt (AT-OBV)AC00350863 400-101 YWOAW MAG2-1 100317.400/101 2218492770004498 |
language |
English |
format |
Book |
author2 |
Berg, Robert F. |
author_facet |
Berg, Robert F. |
author2_variant |
r f b rf rfb |
author2_role |
HerausgeberIn |
title |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry |
spellingShingle |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry NIST special publications |
title_sub |
workshop on mass flow measurement and control for the semiconductor industry |
title_full |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry Robert F. Berg ... |
title_fullStr |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry Robert F. Berg ... |
title_full_unstemmed |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry Robert F. Berg ... |
title_auth |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry |
title_new |
Semiconductor measurement technology |
title_sort |
semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry |
series |
NIST special publications |
series2 |
NIST special publications |
publishDate |
2001 |
physical |
IV, 86 S. Ill., graph. Darst. 28 cm |
callnumber-raw |
100317.400/101 |
callnumber-search |
100317.400/101 |
illustrated |
Illustrated |
work_keys_str_mv |
AT bergrobertf semiconductormeasurementtechnologyworkshoponmassflowmeasurementandcontrolforthesemiconductorindustry |
status_str |
n |
ids_txt_mv |
(AT-OBV)AC03227219 AC03227219 (Aleph)003221744ACC01 (DE-599)OBVAC03227219 (EXLNZ-43ACC_NETWORK)990032217440203331 |
hol852bOwn_txt_mv |
YWOAW |
hol852hSignatur_txt_mv |
100317.400/101 |
hol852cSonderstandort_txt_mv |
MAG2-1 |
itmData_txt_mv |
2001-07-20 02:00:00 Europe/Vienna |
barcode_str_mv |
+YW19640X |
callnumbers_txt_mv |
100317.400/101 |
inventoryNumbers_str_mv |
100317.400/101 |
materialTypes_str_mv |
BOOK |
permanentLibraries_str_mv |
YWOAW |
permanentLocations_str_mv |
MAG2-1 |
inventoryDates_str_mv |
2001-07-20 06:43:46 |
createdDates_str_mv |
2001-07-20 02:00:00 Europe/Vienna |
holdingIds_str_mv |
2218492770004498 |
hierarchy_parent_id |
AC00350863 |
hierarchy_parent_title |
NIST special publications 400-101 |
hierarchy_sequence |
400-101 |
is_hierarchy_id |
AC03227219 |
is_hierarchy_title |
Semiconductor measurement technology workshop on mass flow measurement and control for the semiconductor industry |
container_title |
NIST special publications 400-101 |
container_reference |
AC00350863 |
author2_original_writing_str_mv |
noLinkedField |
_version_ |
1787548201112305665 |