Silicon technologies : ion implantation and thermal treatment / / edited by Annie Baudrant.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Year of Publication: | 2011 |
| Language: | English |
| Online Access: | |
| Physical Description: | xvii, 337 p. :; ill. |
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| 082 | 0 | 4 | |a 621.3815/2 |2 22 |
| 245 | 0 | 0 | |a Silicon technologies |h [electronic resource] : |b ion implantation and thermal treatment / |c edited by Annie Baudrant. |
| 260 | |a London : |b ISTE ; |a Hoboken, N.J. : |b Wiley, |c 2011. | ||
| 300 | |a xvii, 337 p. : |b ill. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 520 | |a The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. | ||
| 533 | |a Electronic reproduction. Ann Arbor, MI : ProQuest, 2015. Available via World Wide Web. Access may be limited to ProQuest affiliated libraries. | ||
| 650 | 0 | |a Semiconductor doping. | |
| 650 | 0 | |a Ion implantation. | |
| 650 | 0 | |a Semiconductors |x Heat treatment. | |
| 655 | 4 | |a Electronic books. | |
| 700 | 1 | |a Baudrant, Annie. | |
| 710 | 2 | |a ProQuest (Firm) | |
| 856 | 4 | 0 | |u https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=1124704 |z Click to View |