Silicon technologies : ion implantation and thermal treatment / / edited by Annie Baudrant.
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| TeilnehmendeR: | |
| Year of Publication: | 2011 |
| Language: | English |
| Online Access: | |
| Physical Description: | xvii, 337 p. :; ill. |
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| Summary: | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
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| Bibliography: | Includes bibliographical references and index. |
| ISBN: | 9781848212312 (hc) 1848212313 9781118601112 (electronic bk.) |
| Hierarchical level: | Monograph |
| Statement of Responsibility: | edited by Annie Baudrant. |