Chemical vapor deposition for nanotechnology / / Pietro Mandracci, editor.

Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the...

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Place / Publishing House:[Place of publication not identified] : : IntechOpen,, [2019]
©2019
Year of Publication:2019
Language:English
Physical Description:1 online resource (164 pages) :; illustrations
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LEADER 01090nam a2200313 i 4500
001 993546174904498
005 20221015190118.0
006 m o d
007 cr |||||||||||
008 221015s2019 xx a ob 000 0 eng d
020 |a 1-83881-732-8 
020 |a 1-78984-961-6 
035 |a (CKB)4970000000100385 
035 |a (NjHacI)994970000000100385 
035 |a (oapen)https://directory.doabooks.org/handle/20.500.12854/43075 
035 |a (EXLCZ)994970000000100385 
040 |a NjHacI  |b eng  |e rda  |c NjHacl 
041 0 |a eng 
050 4 |a TS695  |b .C446 2019 
082 0 4 |a 621.38152  |2 23 
100 1 |a Pietro Mandracci  |4 auth 
245 0 0 |a Chemical vapor deposition for nanotechnology /  |c Pietro Mandracci, editor. 
260 |b IntechOpen  |c 2019 
264 1 |a [Place of publication not identified] :  |b IntechOpen,  |c [2019] 
264 4 |c ©2019 
300 |a 1 online resource (164 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
588 |a Description based on: online resource; title from PDF information screen (InTech, viewed October 15, 2022). 
504 |a Includes bibliographical references. 
520 |a Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book. 
546 |a English 
650 0 |a Chemical vapor deposition. 
653 |a Physical Sciences 
653 |a Engineering and Technology 
653 |a Material Science 
653 |a Nanotechnology and Nanomaterials 
776 |z 1-78984-960-8 
700 1 |a Mandracci, Pietro,  |e editor. 
906 |a BOOK 
ADM |b 2023-02-22 20:25:16 Europe/Vienna  |f system  |c marc21  |a 2019-04-13 22:04:18 Europe/Vienna  |g false 
AVE |i DOAB Directory of Open Access Books  |P DOAB Directory of Open Access Books  |x https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5351653910004498&Force_direct=true  |Z 5351653910004498  |b Available  |8 5351653910004498