Advances in Chemical Vapor Deposition

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Advances in Chemical Vapor Deposition

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...

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Sonstige:
Vernardou, Dimitra
Year of Publication:2021
Language:English
Physical Description:1 electronic resource (94 p.)
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(oapen)https://directory.doabooks.org/handle/20.500.12854/68301
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spelling Vernardou, Dimitra edt
Advances in Chemical Vapor Deposition
Basel, Switzerland MDPI - Multidisciplinary Digital Publishing Institute 2021
1 electronic resource (94 p.)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Open access Unrestricted online access star
Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices.
English
Technology: general issues bicssc
APCVD
VO2
processing parameters
2D
chemical vapor deposition
atomic layer deposition
aluminum oxide
aluminum tri-sec-butoxide
thin film
carbon nanotubes
residual gas adsorption
residual gas desorption
field emission
atmospheric pressure CVD
low pressure CVD
hybrid CVD
aerosol assisted CVD
pulsed CVD
perovskite photovoltaic nanomaterials
stabilization
structural design
performance optimization
solar cells
anatase single crystals
process-induced nanostructures
competitive growth
pp-MOCVD
vanadium pentoxide
electrochromic
spray pyrolysis
ammonium metavanadate
CVD
electrochromism
perovskite photovoltaic materials
TiO2
Al2O3
V2O5
computational fluid dynamics
3-03943-923-5
3-03943-924-3
Vernardou, Dimitra oth
language English
format eBook
author2 Vernardou, Dimitra
author_facet Vernardou, Dimitra
author2_variant d v dv
author2_role Sonstige
title Advances in Chemical Vapor Deposition
spellingShingle Advances in Chemical Vapor Deposition
title_full Advances in Chemical Vapor Deposition
title_fullStr Advances in Chemical Vapor Deposition
title_full_unstemmed Advances in Chemical Vapor Deposition
title_auth Advances in Chemical Vapor Deposition
title_new Advances in Chemical Vapor Deposition
title_sort advances in chemical vapor deposition
publisher MDPI - Multidisciplinary Digital Publishing Institute
publishDate 2021
physical 1 electronic resource (94 p.)
isbn 3-03943-923-5
3-03943-924-3
illustrated Not Illustrated
work_keys_str_mv AT vernardoudimitra advancesinchemicalvapordeposition
status_str n
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is_hierarchy_title Advances in Chemical Vapor Deposition
author2_original_writing_str_mv noLinkedField
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