Advances in Chemical Vapor Deposition

Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-ru...

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Year of Publication:2021
Language:English
Physical Description:1 electronic resource (94 p.)
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LEADER 03073nam-a2200757z--4500
001 993546008004498
005 20231214132832.0
006 m o d
007 cr|mn|---annan
008 202105s2021 xx |||||o ||| 0|eng d
035 |a (CKB)5400000000045854 
035 |a (oapen)https://directory.doabooks.org/handle/20.500.12854/68301 
035 |a (EXLCZ)995400000000045854 
041 0 |a eng 
100 1 |a Vernardou, Dimitra  |4 edt 
245 1 0 |a Advances in Chemical Vapor Deposition 
260 |a Basel, Switzerland  |b MDPI - Multidisciplinary Digital Publishing Institute  |c 2021 
300 |a 1 electronic resource (94 p.) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
506 |a Open access  |f Unrestricted online access  |2 star 
520 |a Pursuing a scalable production methodology for materials and advancing it from the laboratory to industry is beneficial to novel daily-life applications. From this perspective, chemical vapor deposition (CVD) offers a compromise between efficiency, controllability, tunability and excellent run-to-run repeatability in the coverage of monolayers on substrates. Hence, CVD meets all of the requirements for industrialization in basically all areas, including polymer coatings, metals, water-filtration systems, solar cells and so on. The Special Issue “Advances in Chemical Vapor Deposition” is dedicated to providing an overview of the latest experimental findings and identifying the growth parameters and characteristics of perovskites, TiO2, Al2O3, VO2 and V2O5 with desired qualities for potentially useful devices. 
546 |a English 
650 7 |a Technology: general issues  |2 bicssc 
653 |a APCVD 
653 |a VO2 
653 |a processing parameters 
653 |a 2D 
653 |a chemical vapor deposition 
653 |a atomic layer deposition 
653 |a aluminum oxide 
653 |a aluminum tri-sec-butoxide 
653 |a thin film 
653 |a carbon nanotubes 
653 |a residual gas adsorption 
653 |a residual gas desorption 
653 |a field emission 
653 |a atmospheric pressure CVD 
653 |a low pressure CVD 
653 |a hybrid CVD 
653 |a aerosol assisted CVD 
653 |a pulsed CVD 
653 |a perovskite photovoltaic nanomaterials 
653 |a stabilization 
653 |a structural design 
653 |a performance optimization 
653 |a solar cells 
653 |a anatase single crystals 
653 |a process-induced nanostructures 
653 |a competitive growth 
653 |a pp-MOCVD 
653 |a vanadium pentoxide 
653 |a electrochromic 
653 |a spray pyrolysis 
653 |a ammonium metavanadate 
653 |a CVD 
653 |a electrochromism 
653 |a perovskite photovoltaic materials 
653 |a TiO2 
653 |a Al2O3 
653 |a V2O5 
653 |a computational fluid dynamics 
776 |z 3-03943-923-5 
776 |z 3-03943-924-3 
700 1 |a Vernardou, Dimitra  |4 oth 
906 |a BOOK 
ADM |b 2023-12-15 05:32:57 Europe/Vienna  |f system  |c marc21  |a 2022-04-04 09:22:53 Europe/Vienna  |g false 
AVE |i DOAB Directory of Open Access Books  |P DOAB Directory of Open Access Books  |x https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5338064960004498&Force_direct=true  |Z 5338064960004498  |b Available  |8 5338064960004498