Updates in Advanced Lithography / / edited by Sumio Hosaka.
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the so...
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| Place / Publishing House: | [Place of publication not identified] : : IntechOpen,, 2013. |
| Year of Publication: | 2013 |
| Language: | English |
| Physical Description: | 1 online resource (262 pages) |
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(CKB)4970000000098733 (NjHacI)994970000000098733 (oapen)https://directory.doabooks.org/handle/20.500.12854/66578 (EXLCZ)994970000000098733 |
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Hosaka, Sumio edt Updates in Advanced Lithography / edited by Sumio Hosaka. IntechOpen 2013 [Place of publication not identified] : IntechOpen, 2013. 1 online resource (262 pages) text txt rdacontent computer c rdamedia online resource cr rdacarrier Description based on: online resource; title from PDF information screen (InTech, viewed October 19, 2022). Includes bibliographical references and index. Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications. English Condensed matter. Condensed matter physics (liquid state & solid state physics) 953-51-1175-2 Hosaka, Sumio, editor. |
| language |
English |
| format |
eBook |
| author2 |
Hosaka, Sumio, |
| author_facet |
Hosaka, Sumio, |
| author2_variant |
s h sh s h sh |
| author2_role |
TeilnehmendeR |
| title |
Updates in Advanced Lithography / |
| spellingShingle |
Updates in Advanced Lithography / |
| title_full |
Updates in Advanced Lithography / edited by Sumio Hosaka. |
| title_fullStr |
Updates in Advanced Lithography / edited by Sumio Hosaka. |
| title_full_unstemmed |
Updates in Advanced Lithography / edited by Sumio Hosaka. |
| title_auth |
Updates in Advanced Lithography / |
| title_new |
Updates in Advanced Lithography / |
| title_sort |
updates in advanced lithography / |
| publisher |
IntechOpen IntechOpen, |
| publishDate |
2013 |
| physical |
1 online resource (262 pages) |
| isbn |
953-51-5709-4 953-51-1175-2 |
| callnumber-first |
Q - Science |
| callnumber-subject |
QC - Physics |
| callnumber-label |
QC173 |
| callnumber-sort |
QC 3173.454 U633 42013 |
| illustrated |
Not Illustrated |
| dewey-hundreds |
500 - Science |
| dewey-tens |
530 - Physics |
| dewey-ones |
530 - Physics |
| dewey-full |
530.41 |
| dewey-sort |
3530.41 |
| dewey-raw |
530.41 |
| dewey-search |
530.41 |
| work_keys_str_mv |
AT hosakasumio updatesinadvancedlithography |
| status_str |
n |
| ids_txt_mv |
(CKB)4970000000098733 (NjHacI)994970000000098733 (oapen)https://directory.doabooks.org/handle/20.500.12854/66578 (EXLCZ)994970000000098733 |
| carrierType_str_mv |
cr |
| is_hierarchy_title |
Updates in Advanced Lithography / |
| author2_original_writing_str_mv |
noLinkedField |
| _version_ |
1787548505946980352 |
| fullrecord |
<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01002nam a2200289 i 4500</leader><controlfield tag="001">993545455304498</controlfield><controlfield tag="005">20221019095749.0</controlfield><controlfield tag="006">m o d </controlfield><controlfield tag="007">cr |||||||||||</controlfield><controlfield tag="008">221019s2013 xx ob 001 0 eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">953-51-5709-4</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(CKB)4970000000098733</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(NjHacI)994970000000098733</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(oapen)https://directory.doabooks.org/handle/20.500.12854/66578</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(EXLCZ)994970000000098733</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">NjHacI</subfield><subfield code="b">eng</subfield><subfield code="e">rda</subfield><subfield code="c">NjHacl</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="050" ind1=" " ind2="4"><subfield code="a">QC173.454</subfield><subfield code="b">.U633 2013</subfield></datafield><datafield tag="082" ind1="0" ind2="4"><subfield code="a">530.41</subfield><subfield code="2">23</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Hosaka, Sumio</subfield><subfield code="4">edt</subfield></datafield><datafield tag="245" ind1="0" ind2="0"><subfield code="a">Updates in Advanced Lithography /</subfield><subfield code="c">edited by Sumio Hosaka.</subfield></datafield><datafield tag="260" ind1=" " ind2=" "><subfield code="b">IntechOpen</subfield><subfield code="c">2013</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">[Place of publication not identified] :</subfield><subfield code="b">IntechOpen,</subfield><subfield code="c">2013.</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">1 online resource (262 pages)</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="a">text</subfield><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="a">computer</subfield><subfield code="b">c</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="a">online resource</subfield><subfield code="b">cr</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="588" ind1=" " ind2=" "><subfield code="a">Description based on: online resource; title from PDF information screen (InTech, viewed October 19, 2022).</subfield></datafield><datafield tag="504" ind1=" " ind2=" "><subfield code="a">Includes bibliographical references and index.</subfield></datafield><datafield tag="520" ind1=" " ind2=" "><subfield code="a">Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.</subfield></datafield><datafield tag="546" ind1=" " ind2=" "><subfield code="a">English</subfield></datafield><datafield tag="650" ind1=" " ind2="0"><subfield code="a">Condensed matter.</subfield></datafield><datafield tag="653" ind1=" " ind2=" "><subfield code="a">Condensed matter physics (liquid state & solid state physics)</subfield></datafield><datafield tag="776" ind1=" " ind2=" "><subfield code="z">953-51-1175-2</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Hosaka, Sumio,</subfield><subfield code="e">editor.</subfield></datafield><datafield tag="906" ind1=" " ind2=" "><subfield code="a">BOOK</subfield></datafield><datafield tag="ADM" ind1=" " ind2=" "><subfield code="b">2023-02-22 03:31:22 Europe/Vienna</subfield><subfield code="f">system</subfield><subfield code="c">marc21</subfield><subfield code="a">2019-04-13 22:04:18 Europe/Vienna</subfield><subfield code="g">false</subfield></datafield><datafield tag="AVE" ind1=" " ind2=" "><subfield code="i">DOAB Directory of Open Access Books</subfield><subfield code="P">DOAB Directory of Open Access Books</subfield><subfield code="x">https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5337938850004498&Force_direct=true</subfield><subfield code="Z">5337938850004498</subfield><subfield code="b">Available</subfield><subfield code="8">5337938850004498</subfield></datafield></record></collection> |