Chemical vapor deposition : : recent advances and applications in optical, solar cells and solid state devices / / edited by Sudheer Neralla.
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have e...
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Place / Publishing House: | Rijeka, Croatia : : IntechOpen,, [2016] ©2016 |
Year of Publication: | 2016 |
Language: | English |
Physical Description: | 1 online resource (290 pages) :; illustrations |
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100 | 1 | |a Sudheer Neralla |4 auth | |
245 | 0 | 0 | |a Chemical vapor deposition : |b recent advances and applications in optical, solar cells and solid state devices / |c edited by Sudheer Neralla. |
246 | |a Chemical vapor deposition | ||
246 | |a Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices | ||
260 | |b IntechOpen |c 2016 | ||
264 | 1 | |a Rijeka, Croatia : |b IntechOpen, |c [2016] | |
264 | 4 | |c ©2016 | |
300 | |a 1 online resource (290 pages) : |b illustrations | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
588 | |a Description based on: online resource; title from PDF information screen (InTech, viewed October 17, 2022). | ||
504 | |a Includes bibliographical references. | ||
520 | |a This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations. | ||
546 | |a English | ||
650 | 0 | |a Chemical vapor deposition. | |
653 | |a Physical Sciences | ||
653 | |a Engineering and Technology | ||
653 | |a Chemistry | ||
653 | |a Inorganic Chemistry | ||
653 | |a Solid-State Chemistry | ||
776 | |z 953-51-2572-9 | ||
700 | 1 | |a Neralla, Sudheer , |e editor. | |
906 | |a BOOK | ||
ADM | |b 2023-02-22 21:38:54 Europe/Vienna |f system |c marc21 |a 2017-04-01 16:55:35 Europe/Vienna |g false | ||
AVE | |i DOAB Directory of Open Access Books |P DOAB Directory of Open Access Books |x https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5351649690004498&Force_direct=true |Z 5351649690004498 |b Available |8 5351649690004498 |