Chemical vapor deposition : : recent advances and applications in optical, solar cells and solid state devices / / edited by Sudheer Neralla.

This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have e...

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Place / Publishing House:Rijeka, Croatia : : IntechOpen,, [2016]
©2016
Year of Publication:2016
Language:English
Physical Description:1 online resource (290 pages) :; illustrations
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LEADER 01134nam a2200313 i 4500
001 993543515904498
005 20221018063609.0
006 m o d
007 cr |||||||||||
008 221018s2016 ci a ob 000 0 eng d
020 |a 953-51-4187-2 
020 |a 953-51-2573-7 
035 |a (CKB)3710000001156981 
035 |a (NjHacI)993710000001156981 
035 |a (oapen)https://directory.doabooks.org/handle/20.500.12854/43074 
035 |a (EXLCZ)993710000001156981 
040 |a NjHacI  |b eng  |e rda  |c NjHacl 
041 0 |a eng 
050 4 |a TS695  |b .C446 2016 
082 0 4 |a 621.38152  |2 23 
100 1 |a Sudheer Neralla  |4 auth 
245 0 0 |a Chemical vapor deposition :  |b recent advances and applications in optical, solar cells and solid state devices /  |c edited by Sudheer Neralla. 
246 |a Chemical vapor deposition  
246 |a Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices 
260 |b IntechOpen  |c 2016 
264 1 |a Rijeka, Croatia :  |b IntechOpen,  |c [2016] 
264 4 |c ©2016 
300 |a 1 online resource (290 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
588 |a Description based on: online resource; title from PDF information screen (InTech, viewed October 17, 2022). 
504 |a Includes bibliographical references. 
520 |a This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations. 
546 |a English 
650 0 |a Chemical vapor deposition. 
653 |a Physical Sciences 
653 |a Engineering and Technology 
653 |a Chemistry 
653 |a Inorganic Chemistry 
653 |a Solid-State Chemistry 
776 |z 953-51-2572-9 
700 1 |a Neralla, Sudheer ,  |e editor. 
906 |a BOOK 
ADM |b 2023-02-22 21:38:54 Europe/Vienna  |f system  |c marc21  |a 2017-04-01 16:55:35 Europe/Vienna  |g false 
AVE |i DOAB Directory of Open Access Books  |P DOAB Directory of Open Access Books  |x https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5351649690004498&Force_direct=true  |Z 5351649690004498  |b Available  |8 5351649690004498