Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
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| Superior document: | Linköping Studies in Science and Technology. Dissertations Series ; v.2147 |
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| Place / Publishing House: | Linköping : : Linkopings Universitet,, 2021. {copy}2021. |
| Year of Publication: | 2021 |
| Edition: | 1st ed. |
| Language: | English |
| Series: | Linköping Studies in Science and Technology. Dissertations Series
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| Online Access: | |
| Physical Description: | 1 online resource (79 pages) |
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Table of Contents:
- Intro
- Abstract
- Populärvetenskaplig Sammanfattning
- ملخص علم ي
- Preface
- Acknowledgement
- List of Articles
- Table of Contents
- 1. Introduction
- 2. Chemical Vapor Deposition
- 3. Area Selective CVD
- 4. Characterization Techniques
- 5.Contribution to the Field
- 6. Outlook
- References
- Papers.