Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.

Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.

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Superior document:Linköping Studies in Science and Technology. Dissertations Series ; v.2147
:
Nadhom, Hama.
Place / Publishing House:Linköping : : Linkopings Universitet,, 2021.
{copy}2021.
Year of Publication:2021
Edition:1st ed.
Language:English
Series:Linköping Studies in Science and Technology. Dissertations Series
Online Access:
Physical Description:1 online resource (79 pages)
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ctrlnum (MiAaPQ)5006628984
(Au-PeEL)EBL6628984
(OCoLC)1255230646
collection bib_alma
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spelling Nadhom, Hama.
Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
1st ed.
Linköping : Linkopings Universitet, 2021.
{copy}2021.
1 online resource (79 pages)
text txt rdacontent
computer c rdamedia
online resource cr rdacarrier
Linköping Studies in Science and Technology. Dissertations Series ; v.2147
Intro -- Abstract -- Populärvetenskaplig Sammanfattning -- ملخص علم ي -- Preface -- Acknowledgement -- List of Articles -- Table of Contents -- 1. Introduction -- 2. Chemical Vapor Deposition -- 3. Area Selective CVD -- 4. Characterization Techniques -- 5.Contribution to the Field -- 6. Outlook -- References -- Papers.
Description based on publisher supplied metadata and other sources.
Electronic reproduction. Ann Arbor, Michigan : ProQuest Ebook Central, 2024. Available via World Wide Web. Access may be limited to ProQuest Ebook Central affiliated libraries.
Electronic books.
Print version: Nadhom, Hama Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents Linköping : Linkopings Universitet,c2021
ProQuest (Firm)
Linköping Studies in Science and Technology. Dissertations Series
https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=6628984 Click to View
language English
format eBook
author Nadhom, Hama.
spellingShingle Nadhom, Hama.
Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
Linköping Studies in Science and Technology. Dissertations Series ;
Intro -- Abstract -- Populärvetenskaplig Sammanfattning -- ملخص علم ي -- Preface -- Acknowledgement -- List of Articles -- Table of Contents -- 1. Introduction -- 2. Chemical Vapor Deposition -- 3. Area Selective CVD -- 4. Characterization Techniques -- 5.Contribution to the Field -- 6. Outlook -- References -- Papers.
author_facet Nadhom, Hama.
author_variant h n hn
author_sort Nadhom, Hama.
title Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_full Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_fullStr Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_full_unstemmed Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_auth Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_new Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
title_sort area selective chemical vapor deposition of metallic films using plasma electrons as reducing agents.
series Linköping Studies in Science and Technology. Dissertations Series ;
series2 Linköping Studies in Science and Technology. Dissertations Series ;
publisher Linkopings Universitet,
publishDate 2021
physical 1 online resource (79 pages)
edition 1st ed.
contents Intro -- Abstract -- Populärvetenskaplig Sammanfattning -- ملخص علم ي -- Preface -- Acknowledgement -- List of Articles -- Table of Contents -- 1. Introduction -- 2. Chemical Vapor Deposition -- 3. Area Selective CVD -- 4. Characterization Techniques -- 5.Contribution to the Field -- 6. Outlook -- References -- Papers.
isbn 9789179296322
genre Electronic books.
genre_facet Electronic books.
url https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=6628984
illustrated Not Illustrated
oclc_num 1255230646
work_keys_str_mv AT nadhomhama areaselectivechemicalvapordepositionofmetallicfilmsusingplasmaelectronsasreducingagents
status_str n
ids_txt_mv (MiAaPQ)5006628984
(Au-PeEL)EBL6628984
(OCoLC)1255230646
carrierType_str_mv cr
hierarchy_parent_title Linköping Studies in Science and Technology. Dissertations Series ; v.2147
is_hierarchy_title Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents.
container_title Linköping Studies in Science and Technology. Dissertations Series ; v.2147
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