Fluorinated SiC CVD.

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Bibliographic Details
Superior document:Linköping Studies in Science and Technology. Dissertations Series ; v.1826
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Place / Publishing House:Linköping : : Linkopings Universitet,, 2017.
{copy}2017.
Year of Publication:2017
Edition:1st ed.
Language:English
Series:Linköping Studies in Science and Technology. Dissertations Series
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Physical Description:1 online resource (59 pages)
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Table of Contents:
  • Intro
  • ABSTRACT
  • POPULÄRVETENSKAPLIG SAMMANFATTNING
  • PAPERS INCLUDED IN THE THESIS
  • MY CONTRIBUTION TO THE PAPERS
  • ACKNOWLEDGMENT
  • CONTENTS
  • CHAPTER 1 INTRODUCTION
  • CHAPTER 2 SILICON CARBIDE
  • CHAPTER 3 GROWTH METHODS
  • CHAPTER 4 THE HORIZONTAL HOT WALL CVD REACTOR
  • CHAPTER 5 EFFECT OF RELATED PROCESS PARAMETERS
  • CHAPTER 6 MODELLING
  • CHAPTER 7 CHARACTERIZATION
  • CHAPTER 8 FUTURE WORK
  • REFERENCES
  • SUMMARY OF THE INCLUDED PAPERS.