Wide Bandgap Semiconductor Based Micro/Nano Devices
While group IV or III-V based device technologies have reached their technical limitations (e.g., limited detection wavelength range or low power handling capability), wide bandgap (WBG) semiconductors which have band-gaps greater than 3 eV have gained significant attention in recent years as a key...
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Year of Publication: | 2019 |
Language: | English |
Physical Description: | 1 electronic resource (138 p.) |
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Seo, Jung-Hun auth Wide Bandgap Semiconductor Based Micro/Nano Devices MDPI - Multidisciplinary Digital Publishing Institute 2019 1 electronic resource (138 p.) text txt rdacontent computer c rdamedia online resource cr rdacarrier While group IV or III-V based device technologies have reached their technical limitations (e.g., limited detection wavelength range or low power handling capability), wide bandgap (WBG) semiconductors which have band-gaps greater than 3 eV have gained significant attention in recent years as a key semiconductor material in high-performance optoelectronic and electronic devices. These WBG semiconductors have two definitive advantages for optoelectronic and electronic applications due to their large bandgap energy. WBG energy is suitable to absorb or emit ultraviolet (UV) light in optoelectronic devices. It also provides a higher electric breakdown field, which allows electronic devices to possess higher breakdown voltages. This Special Issue seeks research papers, short communications, and review articles that focus on novel synthesis, processing, designs, fabrication, and modeling of various WBG semiconductor power electronics and optoelectronic devices. English ohmic contact MESFET optical band gap wide-bandgap semiconductor annealing temperature junction termination extension (JTE) channel length modulation silicon carbide (SiC) amorphous InGaZnO (a-IGZO) light output power GaN electrochromism large signal performance passivation layer 4H-SiC positive gate bias stress (PGBS) asymmetric power combining ultrahigh upper gate height high electron mobility transistors space application gallium nitride (GaN) phase balance edge termination distributed Bragg reflector cathode field plate (CFP) ammonothermal GaN anode field plate (AFP) W band GaN high electron mobility transistor (HEMT) 1T DRAM growth of GaN tungsten trioxide film thin-film transistor (TFT) micron-sized patterned sapphire substrate power added efficiency T-anode analytical model AlGaN/GaN harsh environment high-temperature operation amplitude balance buffer layer characteristic length Ku-band DIBL effect I-V kink effect flip-chip light-emitting diodes high electron mobility transistors (HEMTs) power amplifier sidewall GaN external quantum efficiency breakdown voltage (BV) threshold voltage (Vth) stability regrown contact AlGaN/GaN HEMT TCAD high electron mobility transistor (HEMT) 3-03897-842-6 |
language |
English |
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author |
Seo, Jung-Hun |
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Seo, Jung-Hun Wide Bandgap Semiconductor Based Micro/Nano Devices |
author_facet |
Seo, Jung-Hun |
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j h s jhs |
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Seo, Jung-Hun |
title |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_full |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_fullStr |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_full_unstemmed |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_auth |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_new |
Wide Bandgap Semiconductor Based Micro/Nano Devices |
title_sort |
wide bandgap semiconductor based micro/nano devices |
publisher |
MDPI - Multidisciplinary Digital Publishing Institute |
publishDate |
2019 |
physical |
1 electronic resource (138 p.) |
isbn |
3-03897-843-4 3-03897-842-6 |
illustrated |
Not Illustrated |
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AT seojunghun widebandgapsemiconductorbasedmicronanodevices |
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(CKB)4920000000095171 (oapen)https://directory.doabooks.org/handle/20.500.12854/62681 (EXLCZ)994920000000095171 |
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Wide Bandgap Semiconductor Based Micro/Nano Devices |
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1792839734297362432 |
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