High-k gate dielectrics for CMOS technology / edited by Gang He and Zhaoqi Sun.
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Year of Publication: | 2012 |
Language: | English |
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Physical Description: | xxxi, 558 p. :; ill. (some col.) |
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Table of Contents:
- pt. 1. Scaling and challenging of Si-based CMOS
- pt. 2. High-k deposition and materials characterization
- pt. 3. Challenge in interface engineering and electrode
- pt. 4. Development in non-Si-based CMOS technology
- pt. 5. High-k Application in novel devices
- pt. 6. Challenge and directions.