Table of Contents: High-k gate dielectrics for CMOS technology

High-k gate dielectrics for CMOS technology

High-k gate dielectrics for CMOS technology / edited by Gang He and Zhaoqi Sun.

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Bibliographic Details
:	ProQuest (Firm)
TeilnehmendeR:	He, Gang. Sun, Zhaoqi. ProQuest (Firm)
Year of Publication:	2012
Language:	English
Online Access:	https://ebookcentral.proquest.com/lib/oeawat/detail.action?docID=956000
Physical Description:	xxxi, 558 p. :; ill. (some col.)
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Table of Contents:

pt. 1. Scaling and challenging of Si-based CMOS
pt. 2. High-k deposition and materials characterization
pt. 3. Challenge in interface engineering and electrode
pt. 4. Development in non-Si-based CMOS technology
pt. 5. High-k Application in novel devices
pt. 6. Challenge and directions.