Plasma Science and Technology : : Progress in Physical States and Chemical Reactions / / edited by Tetsu Mieno.
In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space p...
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Place / Publishing House: | [Place of publication not identified] : : IntechOpen,, 2016. |
Year of Publication: | 2016 |
Language: | English |
Physical Description: | 1 online resource (574 pages) |
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LEADER | 01761nam a2200277 i 4500 | ||
---|---|---|---|
001 | 993638261504498 | ||
005 | 20230220220110.0 | ||
006 | m o d | ||
007 | cr ||||||||||| | ||
008 | 230220s2016 xx o 000 0 eng d | ||
035 | |a (CKB)4920000000094453 | ||
035 | |a (NjHacI)994920000000094453 | ||
035 | |a (EXLCZ)994920000000094453 | ||
040 | |a NjHacI |b eng |e rda |c NjHacl | ||
050 | 4 | |a QC717.6 |b .P537 2016 | |
082 | 0 | 4 | |a 530.44 |2 23 |
245 | 0 | 0 | |a Plasma Science and Technology : |b Progress in Physical States and Chemical Reactions / |c edited by Tetsu Mieno. |
264 | 1 | |a [Place of publication not identified] : |b IntechOpen, |c 2016. | |
300 | |a 1 online resource (574 pages) | ||
336 | |a text |b txt |2 rdacontent | ||
337 | |a computer |b c |2 rdamedia | ||
338 | |a online resource |b cr |2 rdacarrier | ||
588 | |a Description based on publisher supplied metadata and other sources. | ||
520 | |a In the early twentieth century, Dr. Irving Langmuir actively studied plasma discharge and surface science. Since then, great progress has been made in the development of applications of discharges and plasmas such as discharge lamps, electric tubes, and arc welding. In relation to studies on space physics and controlled nuclear fusion, plasma physics has greatly advanced. Plasma chemistry has also progressed along with its applications in LSI fabrication technology, the chemical vapor deposition of functional films, and the production of nanomaterials. In the twenty-first century, the further development of applications of plasma physics and plasma chemistry is certainly expected. In this book, 18 chapters on the recent progress in plasma science and technology have been written by active specialists worldwide. | ||
650 | 0 | |a Plasma (Ionized gases) | |
776 | |z 953-51-4617-3 | ||
700 | 1 | |a Mieno, Tetsu, |e editor. | |
906 | |a BOOK | ||
ADM | |b 2023-12-11 07:01:22 Europe/Vienna |f System |c marc21 |a 2019-11-10 04:18:40 Europe/Vienna |g false | ||
AVE | |i DOAB Directory of Open Access Books |P DOAB Directory of Open Access Books |x https://eu02.alma.exlibrisgroup.com/view/uresolver/43ACC_OEAW/openurl?u.ignore_date_coverage=true&portfolio_pid=5351638300004498&Force_direct=true |Z 5351638300004498 |b Available |8 5351638300004498 |