Atomic layer deposition of titanium, zirconium and hafnium dioxides : growth mechanisms and properties of thin films / Jaan Aarik
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| Superior document: | Dissertationes physicae Universitatis Tartuensis 49 |
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| VerfasserIn: | |
| Place / Publishing House: | Tartu : Tartu Univ. Press, 2007 |
| Year of Publication: | 2007 |
| Language: | English |
| Series: | Dissertationes physicae Universitatis Tartuensis
49 |
| Physical Description: | 218 S.; Ill., graph. Darst.; 25 cm |
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OeAW BAS:IS (Library, Archiv, Collections)
| Location: | BAS:IS-Magazine |
| Call Numbers: | 81528.49 |
| Call Number | 2nd Call Number | Description | Location | Remarks | Status | Availability | Order |
|---|---|---|---|---|---|---|---|
| 81528.49 | BAS:IS-Magazine | Loan | Available | Place a Hold |